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Processing Of High Power Laser Optics

Feb. 12, 2020

OEM cylinder lenses supplier to share with you: In recent years, the development of high-power lasers, deep ultraviolet / X-rays and other fields has not only extended the choice of optical materials, but also proposed extremely precise surfaces for optical components. The processing requirements of surface and ultra-smooth surface, the surface roughness is in the sub-nanometer, which is Angstrom (?). In addition, coating technology with a laser damage threshold greater than 40 J / cm2 and high-power components with absorption rates lower than 0.15% have effectively improved the reliability of lasers above the kilowatt level. Therefore, it is important to seek new breakthroughs in coating technology to achieve dense and precise coatings. At the same time, it is important and urgent to be able to measure the absorbance and laser damage threshold quantitatively, and to develop test instruments that conform to international measurement standards.


Choice of optical materials

For ultraviolet, YAG fiber and semiconductor lasers, commonly used optical element materials include H-K9L, ultraviolet fused quartz (JGS1), Heraeus 313, and Corning 7980. Compared with K9 glass, quartz glass has a lower thermal expansion coefficient, less impurity content, and better optical uniformity, so it is favored by the high-power laser market. In the field of high-power and ultra-fast laser applications, domestic manufacturers are more inclined to foreign Heraeus and Corning materials.

Half Ball Lens

Half Ball Lens


Sub-nanometer polishing technology

In addition to the extremely high requirements for surface accuracy and surface roughness, half ball lens also requires a perfect lattice structure on the surface and no defects, which can eliminate processing damage. The key is the last process: ultra-precision polishing technology. Wavelength photoelectric ultra-smooth surface processing technology combines traditional mechanical removal and magnetic polishing to achieve a surface roughness of less than 5 ?.


Ion sputtering coating technology

Laser thin films are usually prepared by electron gun evaporation or ion beam assisted electron gun evaporation. The film is prone to nodule defects and the existence of microcrystalline particles caused by high temperature film formation. It is difficult to prepare high-quality laser films, which limits the laser of the films Increase in damage threshold. The ion beam reactive sputtering coating technology can form a thin film with an amorphous morphology at a temperature close to normal temperature, and can reduce the optical absorption to a minimum level.

We have prepared hafnium oxide and silicon dioxide laser antireflection coatings using ion beam reactive sputtering deposition equipment, and studied the optical properties, structural characteristics, and laser damage properties of the films. The results show that the laser film deposited by sputtering using dual ion beams is not only dense, but also has extremely low scattering and absorption, a uniform amorphous structure, few impurity defects, and high laser damage threshold. The detected laser damage threshold is 40 J / cm2, as shown in Figure 2. Detection conditions: The test laser wavelength is 1 064 nm, and the pulse width is 10 ns. The test of the sample is performed in a 1-on-1 manner, and the energy density at 0 damage probability is taken as the damage threshold of the sample. There is still a problem that the purity of the film-forming material needs to be improved.

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